Company Filing History:
Years Active: 2006
Title: Shioun Gu: Innovator in Semiconductor Technology
Introduction
Shioun Gu is a notable inventor based in Vancouver, WA (US), recognized for his contributions to semiconductor technology. He has developed innovative solutions that enhance the performance and reliability of semiconductor devices.
Latest Patents
Shioun Gu holds a patent for a semiconductor chip with borderless contact that avoids well leakage. This inventive semiconductor chip features shallow trenches containing field oxide on a substrate. At least one semiconductor device is formed between these shallow trenches. An oxide layer is created over the semiconductor device and the field oxide, followed by an etch stop layer. An inter layer dielectric layer is then formed over the etch stop layer. A contact hole is etched through the inter layer dielectric layer, the etch stop layer, and partially through the oxide layer, which is subsequently filled with a conductive material. This innovative design aims to improve the efficiency and functionality of semiconductor chips.
Career Highlights
Shioun Gu is currently employed at LSI Logic Corporation, where he continues to work on advancing semiconductor technologies. His expertise and innovative mindset have made significant contributions to the field.
Collaborations
Throughout his career, Shioun Gu has collaborated with esteemed colleagues, including Derryl J Allman and Peter McGrath. These collaborations have fostered an environment of innovation and creativity in semiconductor research and development.
Conclusion
Shioun Gu's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patent for a semiconductor chip with borderless contact showcases his ability to solve complex engineering challenges.