Tokyo, Japan

Shiomi Nakagawa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shiomi Nakagawa. Retrieved from https://idiyas.com/inventor/shiomi-nakagawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 13.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Shiomi Nakagawa: Innovator in Bag Design

Introduction

Shiomi Nakagawa is a notable inventor based in Tokyo, Japan. She has made significant contributions to the field of packaging technology, particularly in the design of bags that minimize damage during use.

Latest Patents

Shiomi Nakagawa holds a patent for a unique bag designed to suppress damage such as the formation of holes and wrinkles in laminated bodies constituting a bag. The invention features laminated bodies that include a sealant film positioned on the inner surface of the bag and at least one plastic film on the outer surface side of the sealant film. The bag's seal section has an outer edge seal part along the bag's outer edge and a steam-releasing seal part that peels off when the pressure in the storage section reaches 130 kPa or lower. This innovative design enhances the durability and functionality of bags.

Career Highlights

Shiomi Nakagawa is currently employed at Dai Nippon Printing Co., Ltd., where she continues to develop innovative packaging solutions. Her work has been instrumental in advancing the technology used in bag manufacturing.

Collaborations

Some of her coworkers include Daisuke Tanaka and Yasunari Iio, who contribute to the collaborative environment at Dai Nippon Printing Co., Ltd.

Conclusion

Shiomi Nakagawa's inventive spirit and dedication to improving bag design have led to significant advancements in packaging technology. Her patent reflects her commitment to innovation and quality in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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