Tokyo, Japan

Shinzi Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Hodogaya Chemical Co., Ltd.. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinzi Ishikawa. Retrieved from https://idiyas.com/inventor/shinzi-ishikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shinzi Ishikawa

Introduction

Shinzi Ishikawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative adhesive and coating solutions. His work has garnered attention for its practical applications in various industries.

Latest Patents

Ishikawa holds a patent for a water-base polyurethane emulsion. This emulsion is particularly useful as an adhesive or coating material for polyolefin resin. The invention is characterized by the use of a hydrogenated polyalkadiene polyol as the polyol component, which enhances the performance of the adhesive.

Career Highlights

Shinzi Ishikawa is associated with Hodogaya Chemical Co., Ltd., where he has been instrumental in advancing the company's research and development efforts. His expertise in polymer chemistry has led to the creation of innovative products that meet the demands of modern applications.

Collaborations

Ishikawa has worked alongside talented colleagues such as Shigeru Shimada and Akira Kuroda. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Shinzi Ishikawa's contributions to the field of materials science, particularly through his patented water-base polyurethane emulsion, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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