Company Filing History:
Years Active: 2020-2022
Title: Shinya Usuda: Innovator in Ceria-based Composite Particle Technology
Introduction
Shinya Usuda is a prominent inventor based in Kitakyushu, Japan. He has made significant contributions to the field of materials science, particularly in the development of ceria-based composite particles. With a total of 3 patents to his name, Usuda's work focuses on enhancing polishing techniques for various materials.
Latest Patents
Usuda's latest patents include innovations such as a ceria-based composite fine particle dispersion and a production method for polishing abrasive grain dispersion. His research aims to provide a ceria-based composite particle dispersion that can effectively polish silica film, silicon wafers, and other hard-to-process materials at high rates while achieving superior surface accuracy. The ceria-based composite particles he developed feature a unique structure, including a mother particle composed of amorphous silica and child particles made of crystalline ceria. These innovations are characterized by specific mass ratios and particle size distributions, which are crucial for their performance in polishing applications.
Career Highlights
Shinya Usuda is currently employed at JGC Catalysts & Chemicals Ltd., where he continues to advance his research in composite materials. His work has garnered attention for its potential applications in various industries, including electronics and materials processing.
Collaborations
Usuda collaborates with notable colleagues such as Yuji Tawarazako and Michio Komatsu, contributing to a dynamic research environment that fosters innovation and development in the field of materials science.
Conclusion
Shinya Usuda's contributions to ceria-based composite particle technology highlight his role as a key innovator in the field. His patents reflect a commitment to advancing polishing techniques and improving material processing capabilities.