Kariya, Japan

Shinya Sugiura

This inventor holds 4 USPTO granted patents. Top assignees: Hitachi Metals, Ltd., Hitachi Metals, Ltd. and Denso Corporation, Nippondenso Co., Ltd.. Active years: 1998-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Sugiura. Retrieved from https://idiyas.com/inventor/shinya-sugiura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.1

ph-index = 4

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 1998-2002

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4 patents (USPTO):Explore Patents

Title: Shinya Sugiura: Innovator in Magnetic Technology

Introduction

Shinya Sugiura is a notable inventor based in Kariya, Japan. He has made significant contributions to the field of magnetic technology, holding a total of 4 patents. His work has had a considerable impact on various applications, particularly in electromagnetic devices.

Latest Patents

Among his latest innovations is the "Composite magnetic member, process for producing the member and electromagnetic valve using the member." This patent highlights his expertise in developing advanced materials and components that enhance the performance of electromagnetic systems.

Career Highlights

Sugiura has worked with prominent companies, including Nippondenso Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of magnetics.

Collaborations

Throughout his career, Sugiura has collaborated with talented individuals such as Keizo Takeuchi and Tsutomu Inui. These partnerships have fostered innovation and led to the successful development of various technologies.

Conclusion

Shinya Sugiura's contributions to magnetic technology and his impressive portfolio of patents underscore his role as a leading inventor in his field. His work continues to influence advancements in electromagnetic applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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