This inventor holds 1 USPTO granted patent. Top assignees: Alphitechnology Co., Ltd., Kofloc Corp.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Shinya Otsuki: Inventor of a Corrosion-Resistant Coriolis Mass Flowmeter
Introduction
Shinya Otsuki is an inventor associated with Chiba, Japan. His work includes a patent for a Coriolis mass flowmeter designed to measure corrosive fluids while avoiding the risk of metal-ion elution. Otsuki has been associated with Alphitechnology Co., Ltd. and Kofloc Corp.
Latest Patents
Otsuki’s listed patent is “Coriolis mass flowmeter with no risk of metal ion elution.” The invention describes a straight tube that carries the fluid being measured, an exciter that makes the tube vibrate, and two detectors that sense its vibration. Supports hold the tube’s ends, while frames connected to the supports carry the exciter and detectors. The instrument determines the fluid’s mass flow rate from the phase shift between the vibration waveforms detected at the two points.
The tube, supports, and frames are made from a highly elastic plastic material. This construction is intended to enable measurement of corrosive fluids without the risk of metal ions eluting from those components. Otsuki is credited with 1 patent.
Career Highlights
Otsuki’s patent reflects an engineering approach focused on material selection and measurement reliability. By specifying plastic for key structural components, the design addresses concerns associated with metal-ion elution in applications involving corrosive fluids. His listed company affiliations are Alphitechnology Co., Ltd. and Kofloc Corp.
Collaborations
Keiji Kido and Nozomi Kojima are identified as Otsuki’s coworkers.
Conclusion
Shinya Otsuki’s patented Coriolis mass flowmeter combines vibration-based flow measurement with highly elastic plastic components, offering a design intended for corrosive-fluid applications where metal-ion elution is a concern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile