Chiyoda-ku, Japan

Shinya Kato

This inventor holds 1 USPTO granted patent. Top assignee: Kuraray Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Kato. Retrieved from https://idiyas.com/inventor/shinya-kato-vp1qbezr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shinya Kato: Innovator in Polyurethane Modification

Introduction

Shinya Kato is a notable inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of polyurethane technology. His innovative work has led to the development of a unique modification method for polyurethane, which has practical applications in various industries.

Latest Patents

Shinya Kato holds 1 patent related to the modification of polyurethane. His patent details a modification method that includes preparing a polyurethane with an ethylenically unsaturated bond and treating it with a liquid containing a compound with a conjugated double bond. This method enhances the properties of polyurethane, making it more versatile for different applications.

Career Highlights

Kato is associated with Kuraray Co., Ltd., a company known for its advanced materials and innovative solutions. His work at Kuraray has allowed him to focus on developing new technologies that improve the performance of polyurethane products.

Collaborations

Throughout his career, Shinya Kato has collaborated with talented individuals such as Azusa Oshita and Mitsuru Kato. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Shinya Kato's contributions to polyurethane modification demonstrate his commitment to innovation and excellence in his field. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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