Yokohama, Japan

Shinya Ikeda


Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 34(Granted Patents)


Location History:

  • Kanagawa, JP (1994)
  • Yokohama, JP (1994 - 1996)
  • Kawasaki, JP (2000)

Company Filing History:


Years Active: 1994-2000

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4 patents (USPTO):Explore Patents

Title: Shinya Ikeda: Innovator in Positive Resist Composition

Introduction

Shinya Ikeda is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of positive resist compositions. With a total of 4 patents to his name, Ikeda's work has had a notable impact on the industry.

Latest Patents

One of Ikeda's latest patents focuses on a positive resist composition that includes an alkali-soluble phenolic resin and a photosensitive agent. This composition is characterized by the inclusion of a quinonediazide sulfonate derived from specific phenolic compounds. The detailed chemical structures involved highlight the innovative approach Ikeda has taken in creating materials suitable for minute processing applications.

Career Highlights

Shinya Ikeda is currently employed at Nippon Zeon Company, Ltd., where he continues to advance his research and development efforts. His expertise in polymer chemistry and materials science has positioned him as a key figure in his field. His work not only contributes to the advancement of technology but also enhances the capabilities of various applications in the industry.

Collaborations

Ikeda has collaborated with notable colleagues, including Shoji Kawata and Masayuki Oie. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Shinya Ikeda's contributions to the field of positive resist compositions exemplify his dedication to innovation and excellence. His work continues to influence the industry and inspire future advancements in materials science.

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