Kariya, Japan

Shinya Abe

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Denso Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Abe. Retrieved from https://idiyas.com/inventor/shinya-abe-ls9ctoy8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shinya Abe - Innovator in Control Systems

Introduction

Shinya Abe is an inventor based in Kariya-city, Japan. He is known for his contributions to control systems and application program quality verification. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Shinya Abe's recent patent applications include a "CONTROL APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD." This invention involves a control apparatus that receives malfunction occurrence triggers from a mobile object. It acquires traveling-related information in response to these triggers. The control unit transmits malfunction information to an external device based on specific conditions related to the traveling information.

Another notable application is the "APPLICATION PROGRAM QUALITY VERIFICATION SYSTEM, APPLICATION PROGRAM DISTRIBUTION DEVICE, AND STORAGE MEDIUM." This system is designed to verify the quality of application programs delivered to on-board devices. It includes a comparison unit that assesses operational signals against comparison targets. The system determines whether the application can operate normally and whether it can be practically used.

Conclusion

Shinya Abe's work in control systems and application program verification showcases his innovative spirit. His latest patent applications reflect his commitment to advancing technology in these fields.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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