Nagoya, Japan

Shintarou Oyama

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shintarou Oyama. Retrieved from https://idiyas.com/inventor/shintarou-oyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Shintarou Oyama: Innovator in Drill Bit Technology

Introduction

Shintarou Oyama is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of drilling technology, particularly in the development of drill bits designed for challenging materials.

Latest Patents

Oyama holds a patent for a drill bit and hole formation method. This innovative method enables the formation of high-quality holes even when working with difficult-to-machine metals or fiber-reinforced composite materials. The drill bit features at least one cutting edge and a face that includes a recess with a prescribed planar shape, enhancing its effectiveness in various applications.

Career Highlights

Shintarou Oyama is currently employed at Mitsubishi Gas Chemical Company, Inc. His work focuses on advancing drilling technologies that improve efficiency and quality in manufacturing processes.

Collaborations

Oyama collaborates with talented coworkers, including Yousuke Matsuyama and Takaaki Ogashiwa. Their combined expertise contributes to the innovative projects at their company.

Conclusion

Shintarou Oyama's contributions to drill bit technology exemplify the importance of innovation in engineering. His work continues to influence the industry and improve manufacturing capabilities.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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