Tokyo, Japan

Shintaro Tano

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Fujikoki Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shintaro Tano. Retrieved from https://idiyas.com/inventor/shintaro-tano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Shintaro Tano: Innovator in Expansion Valve Technology

Introduction

Shintaro Tano is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of valve technology, particularly with his innovative designs that enhance functionality and efficiency.

Latest Patents

Shintaro Tano holds a patent for an expansion valve with a solenoid valve. This invention showcases his expertise in creating solutions that address specific challenges in fluid control systems. His patent is a testament to his commitment to advancing technology in this area.

Career Highlights

Tano is currently employed at Fujikoki Corporation, a company known for its dedication to developing high-quality valve products. His role at Fujikoki allows him to apply his inventive skills in a practical setting, contributing to the company's reputation for innovation.

Collaborations

Throughout his career, Shintaro has worked alongside talented colleagues, including Tomonori Shimura and Masashi Hayasaka. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Shintaro Tano's work in the field of expansion valves exemplifies the impact of innovation on industrial applications. His contributions continue to influence the industry and inspire future advancements in valve technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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