Shintaro Nasu

Title: Shintaro Nasu: Innovator in Photocurable Resin Technology

Introduction

Shintaro Nasu is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photocurable resin technology, holding two patents that showcase his innovative approach to material science.

Latest Patents

Nasu's latest patents include a photocurable resin composition for imprinting and a method for producing a pattern-formed body. The first patent describes a resin composition that includes a polymerizable compound with a siloxane bond and a photopolymerization initiator. This composition is designed to have a specific ratio of oxygen atoms bonded to silicon, ensuring optimal performance in imprinting applications. The second patent focuses on a resin composition capable of forming a film that exhibits excellent hardness and heat resistance, which is crucial for touch panel sensors.

Career Highlights

Throughout his career, Shintaro Nasu has worked with notable companies such as Dai Nippon Printing Co., Ltd. and DNP Fine Chemicals Co., Ltd. His work in these organizations has allowed him to develop and refine his innovative ideas in resin technology.

Collaborations

Nasu has collaborated with esteemed colleagues, including Hirokazu Oda and Masakazu Kaneko. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Shintaro Nasu's contributions to photocurable resin technology highlight his role as an influential inventor in the field. His innovative patents and collaborations reflect his commitment to advancing material science and technology.