The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

Mar. 28, 2013
Applicant:

Dnp Fine Chemicals Co., Ltd., Kanagawa, JP;

Inventors:

Shintaro Nasu, Tokyo-to, JP;

Satoshi Shioda, Kanagawa, JP;

Hiroshi Takeichi, Kanagawa, JP;

Assignee:

DNP FINE CHEMICALS CO., LTD., Yokohama-shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 83/04 (2006.01); G06F 3/041 (2006.01); C08F 230/08 (2006.01); G03F 7/027 (2006.01); C08F 283/12 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01); H05K 3/28 (2006.01); H05K 1/02 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
G06F 3/041 (2013.01); C08F 230/08 (2013.01); C08F 283/12 (2013.01); C08L 83/04 (2013.01); G03F 7/027 (2013.01); G03F 7/038 (2013.01); G03F 7/0757 (2013.01); H05K 3/287 (2013.01); G06F 2203/04112 (2013.01); H05K 1/0274 (2013.01); H05K 1/0326 (2013.01); H05K 1/0346 (2013.01); H05K 2201/0108 (2013.01); H05K 2201/0162 (2013.01); H05K 2201/0326 (2013.01);
Abstract

The present invention has a main purpose of providing a resin composition capable of forming a resin film excellent in hardness and heat resistance. To achieve the purpose described above, the present invention provides a resin composition, comprising: a developable polysiloxane containing a developable group and substantially no radically polymerizable group; a polymerizable polysiloxane containing a radically polymerizable group and substantially no developable group; and a polyfunctional monomer.


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