Utsunomiya, Japan

Shintaro Narioka

USPTO Granted Patents = 5 

Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Utsunomiya, JP (2019 - 2021)
  • Tochigi, JP (2024)

Company Filing History:


Years Active: 2019-2025

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5 patents (USPTO):

Title: Innovations by Shintaro Narioka

Introduction

Shintaro Narioka is a notable inventor based in Utsunomiya, Japan. He has made significant contributions to the field of simulation methods and devices, holding a total of four patents. His work focuses on improving the efficiency of film-forming processes, particularly in relation to curable compositions.

Latest Patents

Narioka's latest patents include a simulation method, a simulation device, and a storage device. One of his innovative simulation methods aims to efficiently simulate the disappearance of air bubbles during the film-forming process. This method involves computing the size of each air bubble at the moment they become trapped due to contact with a mold. It also includes a step to obtain the disappearing process of these air bubbles based on their size and the time they become trapped. Another patent focuses on predicting the behavior of a curable composition when droplets are brought into contact with each other. This method inputs physical property values and movement profiles to obtain gas pressure and predict the amount of residual gas confined among the droplets.

Career Highlights

Shintaro Narioka is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to develop and refine his innovative ideas, contributing to advancements in simulation technology.

Collaborations

Narioka collaborates with Yuichiro Oguchi, a fellow innovator, to enhance their research and development efforts. Their partnership has led to the creation of impactful technologies in their field.

Conclusion

Shintaro Narioka's contributions to simulation methods and devices demonstrate his commitment to innovation in the technology sector. His patents reflect a deep understanding of the complexities involved in film-forming processes, showcasing his expertise and creativity.

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