Otsu, Japan

Shintaro Nanbara

This inventor holds 1 USPTO granted patent. Top assignees: Nippon Mektron Limited, Toyo Boseki Kabushiki Kaisha. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shintaro Nanbara. Retrieved from https://idiyas.com/inventor/shintaro-nanbara-uqwddysw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Shintaro Nanbara: Innovator in Adhesive Resin Technology

Introduction

Shintaro Nanbara is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of adhesive technology, particularly through his innovative resin compositions. His work has implications for various applications, including printed wiring boards.

Latest Patents

Shintaro Nanbara holds 1 patent related to a resin composition for adhesives. This patent encompasses a resin composition that includes a polyurethane resin with a carboxyl group, an epoxy resin containing a nitrogen atom, and an epoxy resin with a dicyclopentadiene skeleton. The specific ratios of these components are crucial for achieving the desired adhesive properties.

Career Highlights

Throughout his career, Nanbara has worked with prominent companies such as Toyo Boseki Kabushiki Kaisha and Nippon Mektron Limited. His experience in these organizations has allowed him to refine his expertise in adhesive technologies and contribute to advancements in the field.

Collaborations

Some of his notable coworkers include Takeshi Ito and Hiroko Asada. Their collaborative efforts have likely played a role in the development of innovative adhesive solutions.

Conclusion

Shintaro Nanbara's contributions to adhesive resin technology highlight his role as an inventor dedicated to advancing materials science. His patent reflects a commitment to innovation that continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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