Shintaro Ikeda

Title: Shintaro Ikeda - A Pioneer in Plasma Processing Technology

Introduction

Shintaro Ikeda, an innovative inventor based in Miyagi, Japan, has made significant strides in the field of plasma processing technology. His work, particularly in the development of advanced apparatuses, reflects his commitment to pushing the boundaries of technological innovation.

Latest Patents

Ikeda holds one patent, which is a Plasma Processing Apparatus. This invention is designed with a processing vessel that contains a first member and a second member located outside of the first member. A key feature of this patent is the gas flow passage that allows a gas to flow into the gap between the two members, enhancing the efficiency of plasma processing.

Career Highlights

Ikeda's professional journey includes his pivotal role at Tokyo Electron Limited, where he contributes to the development of cutting-edge semiconductor manufacturing equipment. His expertise and innovative spirit have positioned him as a crucial player in the company’s advancements in technology.

Collaborations

Throughout his career, Shintaro Ikeda has collaborated with notable colleagues, including Hidetoshi Hanaoka and Naoki Tamaru. These collaborations have facilitated the sharing of knowledge and expertise, further driving innovation within the field.

Conclusion

Shintaro Ikeda exemplifies the spirit of innovation through his contributions to plasma processing technology. His patent signifies a notable advancement in the industry and reflects his dedication to enhancing technological capabilities in semiconductor manufacturing. As he continues his work at Tokyo Electron Limited, Ikeda is poised to make even greater contributions to the world of technology.