Tokyo, Japan

Shintaro Futakami

This inventor holds 1 USPTO granted patent. Top assignee: Dexerials Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shintaro Futakami. Retrieved from https://idiyas.com/inventor/shintaro-futakami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Shintaro Futakami: Innovator in Chemical Reaction Technology

Introduction

Shintaro Futakami is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical reaction technology. His innovative approach has led to the development of a unique small reactor and reaction device.

Latest Patents

Futakami holds a patent for a small reactor that features an inorganic transparent substrate. This reactor includes a reaction channel designed to facilitate chemical reactions, a supply channel for introducing samples, and a discharge channel for releasing reaction products. The inorganic transparent substrate is uniquely shaped in an arc, enhancing its functionality.

Career Highlights

Futakami is currently employed at Dexerials Corporation, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its practical applications in various chemical processes.

Collaborations

Throughout his career, Futakami has collaborated with esteemed colleagues such as Akio Takada and Shigeshi Sakakibara. These partnerships have contributed to the advancement of their collective research and development efforts.

Conclusion

Shintaro Futakami's contributions to chemical reaction technology exemplify the spirit of innovation. His patented small reactor showcases his ability to merge functionality with cutting-edge design. His work continues to inspire advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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