Company Filing History:
Years Active: 2018-2020
Title: **Shinpei Ohnishi: Innovating Semiconductor Technology in Kyoto**
Introduction
Shinpei Ohnishi, an inventive mind from Kyoto, Japan, has made significant contributions to the realm of semiconductor technology. With a total of two patents, Ohnishi's work showcases his dedication to pushing the boundaries of innovation in the electronic sector.
Latest Patents
Ohnishi’s latest inventions focus on advanced semiconductor devices. These devices incorporate a semiconductor layer of a first conductivity type, featuring a main surface with a diode trench. This design includes an inner wall insulating film, which consists of a side wall insulating film structured along the trench's side walls, and a thicker bottom wall insulating film lining the bottom of the trench. Additionally, Ohnishi has developed a bidirectional Zener diode positioned on the bottom wall insulating film, comprising a pair of first conductivity type portions along with at least one second conductivity type portion nestled between the first conductivity type portions. This innovation significantly enhances the functionality and efficiency of semiconductor devices.
Career Highlights
Shinpei Ohnishi is associated with Rohm Co., Ltd., a reputable company known for its advancements in semiconductor technology. His role within the organization has allowed him to leverage his expertise in creating groundbreaking products that aid in the development of modern electronics.
Collaborations
During his career, Ohnishi has had the opportunity to collaborate with remarkable individuals, including coworkers Kenji Nishida and Kentaro Nasu. These partnerships foster innovation and contribute to the creation of sophisticated semiconductor technologies.
Conclusion
Shinpei Ohnishi exemplifies the spirit of innovation in the semiconductor industry. Through his patents and collaborations, Ohnishi continues to influence technology advancements, proving that dedicated inventors like him are essential for progress in the field.