Company Filing History:
Years Active: 2021
Title: Shinji Sugahara: Innovator in Plasma Processing Technology
Introduction: Shinji Sugahara, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate processing technology. With a focus on enhancing plasma processing apparatus, he has developed innovative solutions that facilitate more efficient operations in manufacturing processes.
Latest Patents: Sugahara holds a patent for a "Substrate Processing Apparatus and Operation Method of Substrate Processing Apparatus." This plasma processing apparatus comprises a storage unit, processors, and a liquid supply system that introduces a first liquid for processing. A detector monitors key parameters to ensure optimal performance during the processing of substrate materials. Notably, the controller within the apparatus intelligently adjusts operations based on the detection results, ensuring that processing occurs efficiently while adhering to requested conditions.
Career Highlights: Currently, Shinji Sugahara is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has played a critical role in advancing technologies that are essential for modern manufacturing processes, particularly in the production of semiconductors.
Collaborations: Throughout his career, Sugahara has collaborated with notable professionals, including Tomiyasu Maezono and Sadamichi Mori. These partnerships have fostered a productive environment for innovation and have enabled the development of advanced processing technologies.
Conclusion: As an inventor, Shinji Sugahara has demonstrated a remarkable ability to innovate within the realm of plasma processing apparatus. His patented technology reflects a commitment to improving manufacturing efficiency and effectiveness. The advancements made by Sugahara and his teamwork continue to impact the semiconductor industry positively, showcasing the importance of innovation in driving progress.