Tokyo, Japan

Shinji Okawa


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2010-2024

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Shinji Okawa

Introduction

Shinji Okawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in the development of advanced measurement devices and semiconductor manufacturing processes. With a total of four patents to his name, Okawa's work reflects a commitment to innovation and excellence.

Latest Patents

One of Okawa's latest patents is an extracellular potential measurement device. This device includes multiple insulating films made from an electric insulating material, which are stacked and bonded together. It also features multiple electrode wires made from an electroconductive material, arranged at various heights. The design allows for the collection of cells in a recess formed by overlapping openings in the insulating films. Another notable patent is for a method of manufacturing a direct bonded SOI wafer. This process involves creating a laminated body by bonding a semiconductor wafer to a support wafer via an oxide film, followed by the formation of a thin-film single crystal silicon layer.

Career Highlights

Throughout his career, Shinji Okawa has worked with notable companies such as Sumco Corporation and Nok Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Okawa has collaborated with esteemed colleagues, including Etsurou Morita and Isoroku Ono. These partnerships have further enhanced his contributions to the field and fostered a collaborative environment for innovation.

Conclusion

Shinji Okawa's work exemplifies the spirit of innovation in technology. His patents and career achievements highlight his dedication to advancing the field of semiconductor technology and measurement devices. His contributions will continue to influence future developments in these areas.

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