Company Filing History:
Years Active: 2005
Title: The Innovations of Shinichi Nakabayshi
Introduction
Shinichi Nakabayshi is a notable inventor based in Hitachinaka, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to advancements in the fabrication methods of semiconductor integrated circuit devices.
Latest Patents
Shinichi Nakabayshi holds a patent for a fabrication method of semiconductor integrated circuit devices. This patent addresses the issue of micro scratches that can occur during chemical-mechanical polishing. To mitigate this problem, he proposed diluting a polishing slurry with deionized water immediately before it is supplied in the gap between a polishing pad and the surface of a wafer. By increasing the volume of the polishing slurry through dilution, the concentration of coagulated particles is lowered. The recommended mixture ratio of polishing slurry to deionized water is about 1:1–1.2, with the concentration of silica in the diluted slurry adjusted to approximately 3–9 weight %, preferably around 4–8 weight %, and ideally about 8 weight %.
Career Highlights
Shinichi Nakabayshi is associated with Renesas Technology Corporation, where he has been able to apply his innovative ideas in a practical setting. His work has contributed to the advancement of semiconductor manufacturing processes, enhancing the quality and efficiency of integrated circuit devices.
Collaborations
He has collaborated with notable colleagues such as Hisahiko Abe and Hirofumi Tsuchiyama. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technology.
Conclusion
Shinichi Nakabayshi's contributions to the field of semiconductor technology through his innovative patent demonstrate his commitment to improving manufacturing processes. His work continues to influence the industry positively.