Higashikurume, Japan

Shinichi Maeda

This inventor holds 1 USPTO granted patent. Top assignee: Liquid Design Systems Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Maeda. Retrieved from https://idiyas.com/inventor/shinichi-maeda-izf0kko0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shinichi Maeda

Introduction

Shinichi Maeda is a notable inventor based in Higashikurume, Japan. He has made significant contributions to the field of wiring measurement technology. His innovative approach has led to the development of a unique patent that addresses the complexities of high-density wiring.

Latest Patents

Maeda holds a patent for a "Wiring Length Measurement Apparatus and Recording Media." This apparatus includes a distance calculation unit that utilizes multiple coordinates of bending points and CAD data to measure wiring lengths accurately. The technology calculates distances between endpoints and measures the wiring length of high-density wiring, including meander wiring, by summing the distances between calculated endpoints.

Career Highlights

Shinichi Maeda is currently employed at Liquid Design Systems Inc., where he continues to innovate in the field of wiring technology. His work has been instrumental in advancing the capabilities of wiring measurement systems.

Collaborations

Maeda collaborates with Katsuhiko Iwase, contributing to the development of cutting-edge technologies in their field. Their partnership enhances the innovative potential of their projects.

Conclusion

Shinichi Maeda's contributions to wiring measurement technology exemplify the spirit of innovation. His patent and ongoing work at Liquid Design Systems Inc. highlight his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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