Shinichi Koseki

Title: Innovations by Shinichi Koseki

Introduction

Shinichi Koseki is a prominent inventor based in Palo Alto, CA (US). He has made significant contributions to the field of etching technology, holding a total of 4 patents. His work focuses on improving processes for forming high aspect ratio features in substrates.

Latest Patents

One of his latest patents is titled "Endpoint detection in low open area and/or high aspect ratio etch applications." This patent discloses a method for determining the endpoint of an etch operation used for forming high aspect ratio features and/or over low open area on a substrate in a processing chamber. The method begins by obtaining a reference emission curve, followed by performing an etch operation on a patterned substrate. A plasma optical emission intensity is measured for each of the etch cycles, and a differential curve between the reference emission and the plasma optical emissions is calculated. An endpoint is determined for the etch operation based on an inflection point detection or other unique features through pattern recognition in the differential curve.

Another notable patent is "Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching." This patent outlines methods and apparatus for producing high aspect ratio features in a substrate using reactive ion etching. The method involves flowing acetylene gas into a process chamber to produce a diamond-like carbon deposition on a pattern mask or on at least one layer of oxide or nitride on the substrate. It also includes forming a plasma from a gas mixture and performing an anisotropic etch of the substrate using the pattern mask.

Career Highlights

Shinichi Koseki is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His expertise in etching technology has positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Koseki has collaborated with notable colleagues, including Hun Sang Kim and Jinhan Choi. These collaborations have further enhanced the development of advanced etching techniques.

Conclusion

Shinichi Koseki's contributions to etching technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of high aspect ratio feature fabrication.