Shinichi Kohno

Title: The Innovations of Shinichi Kohno

Introduction

Shinichi Kohno is a notable inventor based in Nakakubiki-gun, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on enhancing the manufacturing processes of integrated circuits.

Latest Patents

Kohno holds a patent for a phase shift mask and method of manufacture. This innovative phase shift mask comprises an exposure light-transmitting substrate and a second light-transmitting region. The second light-transmitting region functions as a phase shifter and is made of a fluorine-doped molybdenum silicide film or fluorine-doped chromium silicide film. These materials are formed by a sputtering technique that utilizes molybdenum metal, chromium metal, molybdenum silicide, or chromium silicide as the target, along with SiF as the reactive gas. The phase shifter has a high refractive index to short-wavelength exposure light, enabling a 180-degree phase change to be achieved at a minimum film thickness. Additionally, it exhibits good stability to such light. This phase shift mask can be utilized to fabricate semiconductor integrated circuits with a smaller minimum feature size and a higher level of integration.

Career Highlights

Kohno is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the semiconductor industry. His work has been instrumental in advancing the technology used in the production of integrated circuits.

Collaborations

Throughout his career, Kohno has collaborated with esteemed colleagues such as Tamotsu Maruyama and Yukio Inazuki. These collaborations have further enriched his contributions to the field.

Conclusion

Shinichi Kohno's innovative work in semiconductor technology, particularly his patent for a phase shift mask, showcases his significant impact on the industry. His contributions continue to pave the way for advancements in integrated circuit manufacturing.