Yokohama, Japan

Shinichi Bunya

This inventor holds 3 USPTO granted patents. Top assignees: Konica Corporation, Mitsubishi Kasei Corporation, Mitsubishi Chemical Industries Limited. Active years: 1981-1993.


% Patents Active = 100.0

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 1981-1993

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3 patents (USPTO):Explore Patents

Title: The Innovations of Shinichi Bunya

Introduction

Shinichi Bunya is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of photosensitive compositions and lithographic printing. With a total of 3 patents, his work has had a considerable impact on the industry.

Latest Patents

Bunya's latest patents include a photosensitive composition and a photosensitive lithographic printing method. The first patent discloses a photosensitive composition that comprises a diazo resin and a polymeric compound containing a specific structural unit. This innovation enhances the effectiveness of photosensitive materials in various applications. The second patent focuses on a photosensitive composition that includes a photosensitive diazo compound and a polymeric binder, where the diazo compound features a polymerizable unsaturated bond. This development further advances the capabilities of photosensitive technologies.

Career Highlights

Throughout his career, Shinichi Bunya has worked with prominent companies such as Konica Corporation and Mitsubishi Kasei Corporation. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking innovations in his field.

Collaborations

Bunya has collaborated with several talented individuals, including Shinichi Matsubara and Masafumi Uehara. These partnerships have fostered a creative environment that has led to the development of innovative solutions in photosensitive technologies.

Conclusion

Shinichi Bunya's contributions to the field of photosensitive compositions and lithographic printing demonstrate his commitment to innovation. His patents and collaborations reflect a dedication to advancing technology in meaningful ways.

Profile summary based on public USPTO records.
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