This inventor holds 2 USPTO granted patents. Top assignees: Nec Corporation, Noritsu Koki Co., Ltd., Takuma Co., Ltd.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 1999
Title: Shingo Tokunaga: Innovator in Ionic Substance Removal Technology
Introduction
Shingo Tokunaga is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of ionic substance removal, particularly in applications for super-clean rooms. With a total of two patents to his name, Tokunaga's work is recognized for its innovative approach to enhancing cleanliness in sensitive environments.
Latest Patents
Tokunaga's latest patents include an ionic substance removing material designed for use in super-clean rooms. This invention outlines a method of manufacturing the material, which incorporates an ion exchanger capable of facilitating an ion exchange reaction. Additionally, he has developed another patent for an ionic substance removing material that features a non-ion exchange permeable layer and an anti-dust generation layer. This material is specifically secured to the surface of a concrete wall, ensuring optimal performance in maintaining cleanliness.
Career Highlights
Throughout his career, Shingo Tokunaga has worked with reputable companies such as Noritsu Koki Co., Ltd. and Takuma Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced materials for cleanroom applications.
Collaborations
Tokunaga has collaborated with notable coworkers, including Kunihiro Sakata and Hiroshi Nonaka. Their combined efforts have furthered the development of innovative solutions in the field of ionic substance removal.
Conclusion
Shingo Tokunaga's contributions to ionic substance removal technology highlight his role as a key innovator in the industry. His patents reflect a commitment to improving cleanliness in critical environments, showcasing the importance of innovation in maintaining high standards of hygiene.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile