Naka-gun, Japan

Shingo Okamura


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Saitama, JP (2003)
  • Naka-gun, JP (2006)

Company Filing History:


Years Active: 2003-2006

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2 patents (USPTO):Explore Patents

Title: Shingo Okamura: Innovator in Organozirconium Composites

Introduction

Shingo Okamura is a notable inventor based in Naka-gun, Japan. He has made significant contributions to the field of materials science, particularly in the development of organozirconium composites. With a total of 2 patents to his name, Okamura's work is paving the way for advancements in thin film technology.

Latest Patents

Okamura's latest patents include innovative methods and materials that enhance the synthesis and application of organozirconium composites. One of his patents focuses on an organozirconium composite and the method of synthesizing it, which boasts a decomposition temperature that aligns closely with those of organolead and organotitanium compounds. This advancement allows for precise control over the composition of lead zirconate titanate (PZT) thin films across a broad temperature range. Additionally, his raw material solution minimizes the likelihood of reactions with organolead compounds, thereby reducing the risk of vapor phase cracking during the manufacturing process.

Career Highlights

Shingo Okamura is currently employed at Mitsubishi Materials Corporation, where he continues to innovate in the field of materials science. His work has garnered attention for its potential applications in various industries, particularly in electronics and materials engineering.

Collaborations

Okamura collaborates with esteemed colleagues such as Hideyuki Hirakoso and Katsumi Ogi, contributing to a dynamic research environment that fosters innovation and development.

Conclusion

Shingo Okamura's contributions to the field of organozirconium composites exemplify the impact of innovative thinking in materials science. His patents not only advance the understanding of thin film technology but also open new avenues for future research and applications.

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