Sendai, Japan

Shinei Ryu

This inventor holds 1 USPTO granted patent. Top assignees: Ricoh Company, Ltd., Ricoh Research Institute of General Electronics. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinei Ryu. Retrieved from https://idiyas.com/inventor/shinei-ryu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Shinei Ryu: Innovator in Magnetic Recording Technology

Introduction

Shinei Ryu is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of magnetic recording technology. His innovative work has led to the development of a unique perpendicular magnetic recording medium.

Latest Patents

Ryu holds 1 patent for his invention of a perpendicular magnetic recording medium. This medium comprises a substrate, a soft magnetic layer formed on the substrate, a lower recording layer with a coercive force of Hcl, and an upper recording layer with a coercive force of Hcu. The coercive ratio of Hcu/Hcl is maintained within the range of 1.4 to 3.3, ensuring optimal performance in data storage.

Career Highlights

Throughout his career, Shinei Ryu has worked with prominent companies such as Ricoh Company, Ltd. and Ricoh Research Institute of General Electronics Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Ryu has collaborated with notable colleagues, including Ikue Kawashima and Futoyoshi Koh. These partnerships have fostered a creative environment that has led to innovative solutions in the field of magnetic recording.

Conclusion

Shinei Ryu's contributions to magnetic recording technology exemplify the impact of innovation in modern data storage solutions. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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