This inventor holds 1 USPTO granted patent. Top assignee: Toyo Gosei Kogyo Co., Ltd.. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: The Innovations of Shin Utsunomiya
Introduction
Shin Utsunomiya is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of photosensitive materials. His work has led to advancements that are essential in various applications.
Latest Patents
Utsunomiya holds a patent for a "Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition." This innovation showcases his expertise in developing materials that respond to light, which is crucial for modern technology.
Career Highlights
Utsunomiya is associated with Toyo Gosei Kogyo Co., Ltd., a company known for its focus on advanced materials. His role there has allowed him to explore and develop innovative solutions in the field of photosensitive compositions.
Collaborations
He has worked alongside talented colleagues such as Noriaki Tochizawa and Nobuji Sakai. Their collaborative efforts have contributed to the success of various projects within the company.
Conclusion
Shin Utsunomiya's contributions to the field of photosensitive materials highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future developments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile