Company Filing History:
Years Active: 2013-2014
Title: Innovations by Shin Uchino in Image Data Processing
Introduction
Shin Uchino is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of image data processing, particularly in the context of silicon wafer evaluation and manufacturing. With a total of two patents to his name, Uchino's work addresses critical challenges in the industry.
Latest Patents
Uchino's latest patents include an image data processing method and an image creating method. The image data processing method aims to enhance the measurement of wafers using a surface inspection device that employs a laser scattering method. This method is designed to create a Haze map while minimizing noise caused by variations in detection sensitivity. The process involves measuring haze values at various positions on a wafer surface and applying image data processing techniques to eliminate noise components. Additionally, the image creating method utilizes the processed image data to generate a Haze map.
Another significant patent is a method of evaluating silicon wafers. This method involves obtaining surface distribution information of photoluminescence intensity before and after a thermal oxidation treatment. By analyzing the differences in surface distribution, Uchino's method allows for the evaluation of oxygen precipitates within the silicon wafer.
Career Highlights
Shin Uchino is currently associated with Sumco Corporation, where he continues to innovate in the field of semiconductor manufacturing. His expertise in image data processing and silicon wafer evaluation has positioned him as a valuable asset in the industry.
Collaborations
Uchino has collaborated with notable colleagues, including Masataka Hourai and Yasuo Koike. Their combined efforts contribute to advancements in technology and innovation within their field.
Conclusion
Shin Uchino's contributions to image data processing and silicon wafer evaluation demonstrate his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in this field and provide effective solutions to enhance manufacturing processes.
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