Company Filing History:
Years Active: 2016
Title: Shin-Shing Yeh: Innovator in Optical Proximity Correction
Introduction
Shin-Shing Yeh is an inventor based in Changhua County, Taiwan. He has made significant contributions to the field of optical proximity correction, focusing on the design and application of photomask patterns. His innovative approaches aim to enhance the precision and efficiency of lithography processes.
Latest Patent Applications
Shin-Shing Yeh has submitted several notable patent applications. One of his latest applications is titled "PATTERN FOR OPTICAL PROXIMITY CORRECTION AND DESIGNING METHOD OF PHOTOMASK PATTERN." This application provides a pattern for optical proximity correction that includes a main body portion and a T-shaped portion. The main body portion features at least one right-angled corner, which is composed of a first side and a second side. The T-shaped portion consists of a head portion and an extension portion, with the extension portion connected to the right-angled corner. The angle between the extension direction of the extension portion and either the first or second side is between 130 degrees and 140 degrees.
Another significant application is the "DESIGN METHOD OF PHOTOMASK STRUCTURE." This design method outlines a series of steps, beginning with the provision of a first layout pattern. An assist pattern is then added adjacent to the first layout pattern. Optical proximity correction (OPC) is performed to convert the first layout pattern into a second layout pattern. The assist pattern has an adjacent portion that is close to the second layout pattern, with a first distance that is less than a safety distance. This safety distance is crucial to prevent the assist pattern from being transferred to a photoresist layer during the lithography process. After the OPC is completed, the adjacent portion is shifted to increase the first distance to a second distance, which is greater than or equal to the safety distance.
Conclusion
Shin-Shing Yeh is an innovative inventor whose work in optical proximity correction and photomask design is paving the way for advancements in lithography technology. His latest patent applications reflect his commitment to improving the precision and effectiveness of these processes.