This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Worldwide Semiconductor Manufacturing Corporation. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: The Innovative Contributions of Shin-Pu Jeng
Introduction
Shin-Pu Jeng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to anti-reflective coatings.
Latest Patents
Shin-Pu Jeng holds a patent for a method for forming a bottom anti-reflective coating (BARC). This invention discloses a method for forming an organic anti-reflective coating (ARC) on a substrate using reactive gas. The reactive gas comprises a compound gas containing carbon, hydrogen, and halogen atoms, with a general formula of C,H,X, where X represents a halogen element. The compound gas is designed to enhance the efficiency of the coating process, making it a valuable advancement in semiconductor technology.
Career Highlights
Shin-Pu Jeng is currently employed at Worldwide Semiconductor Manufacturing Corporation, where he applies his expertise in semiconductor processes. His work has contributed to the advancement of manufacturing techniques in the industry.
Collaborations
Some of his notable coworkers include Kung Linliu and Mai-Ru Kuo, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Shin-Pu Jeng's innovative work in developing methods for anti-reflective coatings showcases his significant impact on semiconductor technology. His contributions continue to influence advancements in the industry.