Tokyo, Japan

Shin Oota

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Toppan Printing Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin Oota. Retrieved from https://idiyas.com/inventor/shin-oota

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations by Shin Oota in Cosmetic Manufacturing

Introduction

Shin Oota is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of cosmetic manufacturing. His innovative approach has led to the development of a unique method for producing cosmetic sheets.

Latest Patents

Shin Oota holds 1 patent for his invention titled "Method for manufacturing cosmetic sheet, cosmetic sheet, method for manufacturing cosmetic panel, and cosmetic panel." This patent describes a comprehensive method that includes a preparation step for creating base papers with a high cellulose fiber content. The method also involves a laminating step that incorporates a thermoplastic resin layer, followed by a processing step that applies an embossed shape to the laminate.

Career Highlights

Oota is currently employed at Toppan Printing Co., Ltd., where he continues to innovate in the cosmetic industry. His work has garnered attention for its practical applications and efficiency in manufacturing processes.

Collaborations

Shin Oota collaborates with talented coworkers, including Naoki Tokumoto and Jun Mizutani, who contribute to the innovative environment at Toppan Printing Co., Ltd.

Conclusion

Shin Oota's contributions to cosmetic manufacturing exemplify the impact of innovation in the industry. His patented methods are paving the way for advancements in cosmetic products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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