Taichung, Taiwan

Shin Ju Lin

This inventor holds 1 USPTO granted patent. Top assignee: Ritdisplay Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin Ju Lin. Retrieved from https://idiyas.com/inventor/shin-ju-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shin Ju Lin

Introduction

Shin Ju Lin is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of organic light-emitting diodes (OLEDs). His innovative designs focus on enhancing the performance and efficiency of OLED devices.

Latest Patents

Shin Ju Lin holds a patent for an "Organic light emitting diode device with brightness uniformity design." This invention comprises a substrate, an anode layer, a light-emitting layer, a cathode layer, and a plurality of anode and cathode leads. The design ensures that the currents flowing through the regions of the light-emitting layer are uniform, which enhances the overall brightness and performance of the OLED device. He has 1 patent to his name.

Career Highlights

Shin Ju Lin is currently employed at Ritdisplay Corporation, where he continues to work on advancements in OLED technology. His expertise in the field has made him a valuable asset to the company. His work is characterized by a commitment to innovation and quality.

Collaborations

Shin Ju Lin collaborates with Chung Che Tsou, a fellow innovator in the field. Their partnership has led to advancements in OLED technology and has contributed to the success of their projects.

Conclusion

Shin Ju Lin's contributions to OLED technology demonstrate his innovative spirit and dedication to improving electronic devices. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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