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For the Inventor, By the Inventor

Daito, Japan

Shin-itsu Takehashi

This inventor holds 6 USPTO granted patents. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 1995-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin-itsu Takehashi. Retrieved from https://idiyas.com/inventor/shin-itsu-takehashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 83.3

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 159(Granted Patents)


Location History:

  • Osaka, JP (1995)
  • Shijonawate, JP (2003 - 2006)
  • Daito, JP (2005 - 2007)

Company Filing History:

goldMedal6 out of 27,375 
 
Matsushita Electric Industrial Co., Ltd.
 patents

Years Active: 1995-2007

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6 patents (USPTO):Explore Patents
1. 7306980 - Method for fabricating thin film transistor (2007-12-11),
2. 7084848 - Liquid crystal display device, electroluminescent display device, method of driving the devices, and method of evaluating subpixel arrangement patterns (2006-08-01),
3. 6909413 - Display device (2005-06-21),
4. 6812490 - Thin-film transistor, panel, and methods for producing them (2004-11-02),
5. 6624473 - Thin-film transistor, panel, and methods for producing them (2003-09-23),
6. 5425833 - Semiconductor chip removal process and apparatus (1995-06-20),

Title: Innovations of Shin-itsu Takehashi

Introduction

Shin-itsu Takehashi is a notable inventor based in Daito, Japan. He has made significant contributions to the field of display technology, particularly in liquid crystal displays. With a total of 6 patents, his work has advanced the capabilities and efficiency of display devices.

Latest Patents

One of his latest patents is a method for fabricating thin film transistors. This innovation involves arranging a number of minuscule LDD thin film transistors with high precision on a substrate for use in liquid crystal display apparatuses. The gate electrode serves as a mask during the injection of impurities into the semiconductor layer. To achieve an LDD structure, impurities are injected in two installments, with the size of the gate electrode adjusted according to the length of the LDD regions. This adjustment is accomplished through metal oxidation or dry etching techniques. Additionally, he has developed a liquid crystal display device and an electroluminescent display device, which utilize a unique method of driving the devices and evaluating subpixel arrangement patterns. This active matrix liquid crystal display device features a matrix configuration of unit pixels, each divided into subpixels, enhancing the display's performance and reducing power consumption.

Career Highlights

Shin-itsu Takehashi is associated with Matsushita Electric Industrial Co., Ltd., a company renowned for its innovations in electronics and technology. His work has been instrumental in pushing the boundaries of display technology, making significant strides in both efficiency and functionality.

Collaborations

He has collaborated with notable coworkers such as Tetsuo Kawakita and Kouji Senda, contributing to the advancement of their shared projects and innovations.

Conclusion

Shin-itsu Takehashi's contributions to the field of display technology through his patents and collaborations have made a lasting impact. His innovative methods continue to shape the future of liquid crystal displays and related technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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