Company Filing History:
Years Active: 1986
Title: The Innovations of Shin-ichi Ogawa
Introduction
Shin-ichi Ogawa is a notable inventor based in Katano, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in multilayer semiconductor devices.
Latest Patents
Ogawa holds 1 patent for his invention titled "Method of manufacturing a multilayer semiconductor device." This patent describes a method for obtaining a multilayer semiconductor device by forming a semiconductor crystallized layer through an insulative material over a semiconductor substrate. The process involves several steps, including the formation of an insulative material on the semiconductor substrate, the creation of a first semiconductor layer, and the crystallization of a second semiconductor layer through energy beam irradiation.
Career Highlights
Shin-ichi Ogawa is associated with the Agency of Industrial Science and Technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices. His innovative approach has garnered attention in the scientific community.
Collaborations
Ogawa has collaborated with notable colleagues such as Shigenobu Akiyama and Yasuaki Terui. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation within their field.
Conclusion
Shin-ichi Ogawa's contributions to semiconductor technology exemplify the spirit of innovation. His patent and collaborative efforts continue to influence the industry positively.