This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Semes Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovative Contributions of Shin Hwa Kang
Introduction
Shin Hwa Kang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique method that enhances the efficiency of substrate processing.
Latest Patents
Shin Hwa Kang holds 1 patent for a "Substrate treating apparatus and substrate treating method." This patent discloses a method for treating a substrate that features multiple reference marks and a pattern. The method includes several key operations: a process preparing operation, a location information acquiring operation to gather data on the actual location of the pattern, and a process executing operation that involves supplying a treatment liquid to the substrate. The substrate is then heated by irradiating laser light onto the pattern, which has been treated with the liquid. The location information acquiring operation specifically involves obtaining data on the actual locations of at least three reference marks, which is crucial for determining the actual location of the pattern.
Career Highlights
Shin Hwa Kang is currently employed at Semes Co., Ltd., where he continues to innovate and develop new technologies. His work has positioned him as a key figure in the advancement of substrate treatment methods.
Collaborations
Some of his notable coworkers include Seung Un Oh and Young Ho Park, who contribute to the collaborative environment at Semes Co., Ltd.
Conclusion
Shin Hwa Kang's contributions to substrate treatment technology exemplify the impact of innovative thinking in the field. His patent reflects a significant advancement that could influence future developments in substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile