This inventor holds 1 USPTO granted patent. Top assignee: Dowa Electronics Materials Co., Ltd.. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Innovations of Shin Hamada in Catalyst Technology
Introduction
Shin Hamada is a notable inventor based in Okayama, Japan. He has made significant contributions to the field of catalyst technology, particularly in the development of efficient exhaust gas purification systems. His work focuses on enhancing the combustion of particulate matter (PM) and improving the removal efficiency of harmful gases.
Latest Patents
Hamada holds a patent for a "Method for producing catalyst composition, catalyst composition, diesel particulate filter using the same, and exhaust gas purification system." This innovative catalyst is designed to combust PM at relatively low temperatures while maintaining high hydrocarbon (HC) and carbon monoxide (CO) removal efficiency. The catalyst composition includes at least one platinum group element, such as platinum (Pt), rhodium (Rh), or palladium (Pd), which is supported by a carrier containing elements like zirconium (Zr), aluminum (Al), and others. This unique formulation allows for both PM combustion activity and gas purification activity.
Career Highlights
Shin Hamada is associated with Dowa Electronics Materials Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in creating more effective solutions for reducing emissions from diesel engines.
Collaborations
Hamada collaborates with talented colleagues, including Yoshiyuki Michiaki and Takuma Honda, to further enhance the capabilities of their catalyst technologies.
Conclusion
Shin Hamada's innovative work in catalyst technology represents a significant advancement in the field of exhaust gas purification. His contributions are vital for improving air quality and reducing environmental impact.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile