Tainan, Taiwan

Shin-Gei Chen

This inventor holds 1 USPTO granted patent. Top assignee: National Science Council. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin-Gei Chen. Retrieved from https://idiyas.com/inventor/shin-gei-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shin-Gei Chen

Introduction

Shin-Gei Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of aluminum nitride (AIN) materials. His innovative approaches have led to advancements in the manufacturing processes of these materials.

Latest Patents

Shin-Gei Chen holds a patent for a "Sintering process for AIN powder coated with Al film." This patent application discloses a new process for preparing the sintered article of aluminum nitride at low temperature. It involves coating aluminum metal film on aluminum nitride powder, followed by direct molding or homogeneous cold pressing. The process concludes with sintering at temperatures ranging from 1650 to 1750 degrees Celsius, resulting in the formation of a dense aluminum nitride article. He has 1 patent to his name.

Career Highlights

Shin-Gei Chen is affiliated with the National Science Council, where he continues to engage in research and development. His work has been instrumental in enhancing the properties and applications of aluminum nitride materials, which are crucial in various technological applications.

Collaborations

Some of his notable coworkers include Nan-Chung Wu and Huei-Jung Wang. Their collaborative efforts have contributed to the advancement of research in materials science.

Conclusion

Shin-Gei Chen's innovative work in the field of aluminum nitride materials showcases his dedication to advancing technology through research and development. His contributions are significant in the realm of materials science and continue to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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