Daejeon, South Korea

Shin Bok Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lg Display Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shin Bok Lee. Retrieved from https://idiyas.com/inventor/shin-bok-lee-6z2klgm9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Shin Bok Lee

Introduction

Shin Bok Lee is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of patterning technology, particularly through his innovative designs and patents. His work is instrumental in advancing the capabilities of flexible substrates in various applications.

Latest Patents

Shin Bok Lee holds a patent for a patterning apparatus. This apparatus includes a stage arranged under a flexible substrate, a plurality of correction units closely arranged to the stage, and a pattern forming unit. The correction units are attached to the flexible substrate and are designed to apply a tension force to correct any distortion in the substrate. This innovative design enhances the precision of pattern formation on flexible materials.

Career Highlights

Shin Bok Lee is associated with LG Display Co., Ltd., a leading company in the display technology sector. His work at LG Display has allowed him to contribute to cutting-edge advancements in display technologies, particularly those involving flexible substrates.

Collaborations

Shin Bok Lee has collaborated with notable colleagues, including Nam Seok Lee and Seung Hee Nam. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Shin Bok Lee's contributions to the field of patterning technology exemplify the importance of innovation in advancing modern display technologies. His patent for a patterning apparatus showcases his commitment to improving the functionality and precision of flexible substrates.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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