Shiming Wei

Title: Shiming Wei: Innovator in Metrology and Overlay Systems

Introduction

Shiming Wei is a prominent inventor based in Shanghai, China, known for his contributions to the field of metrology and overlay systems. With a total of two patents to his name, Wei has made significant advancements that enhance the accuracy and efficiency of measurement systems in manufacturing processes.

Latest Patents

Wei's latest patents include "Verification Metrology Targets and Their Design" and "Automatic Recipe Optimization for Overlay Metrology System." The first patent focuses on metrology target design methods and verification targets. It involves using Optical Critical Dimension (OCD) data to estimate discrepancies between target models and actual targets on wafers. This method allows for adjustments in the design model to compensate for production variations, ultimately improving measurement accuracy. The second patent describes an overlay metrology system that utilizes a controller to analyze overlay measurements and generate quality metrics. By employing a supervised machine learning algorithm, the system optimizes recipes or hardware configurations to minimize residual values, enhancing the overall performance of overlay metrology.

Career Highlights

Shiming Wei is currently employed at Kla Corporation, where he applies his expertise in metrology and overlay systems. His work focuses on developing innovative solutions that address challenges in measurement accuracy and process optimization.

Collaborations

Wei collaborates with notable colleagues, including Michael E Adel and Inna Tarshish-Shapir, contributing to a dynamic team that drives advancements in metrology technologies.

Conclusion

Shiming Wei's contributions to metrology and overlay systems reflect his commitment to innovation and excellence in the field. His patents demonstrate a forward-thinking approach that enhances measurement accuracy and efficiency in manufacturing processes.