Shanghai, China

Shiliang Han

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Milliken + Co. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shiliang Han. Retrieved from https://idiyas.com/inventor/shiliang-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Shiliang Han: Innovator in Additive Compositions

Introduction

Shiliang Han is a notable inventor based in Shanghai, China. He has made significant contributions to the field of polymer compositions, particularly through his innovative patent.

Latest Patents

Shiliang Han holds a patent titled "Additive compositions and polymer compositions comprising the same." This patent describes an additive composition that includes an impact modifier, an acetal compound, and a co-additive compound. The composition consists of a plurality of first particles and second particles, where the first particles comprise an impact modifier and the second particles include a thermoplastic polymer, an acetal compound, and a co-additive. Additionally, the polymer composition features a thermoplastic polymer, an impact modifier, an acetal compound, and a co-additive.

Career Highlights

Shiliang Han is currently employed at Milliken & Company, where he continues to develop innovative solutions in the field of materials science. His work focuses on enhancing the properties of polymer compositions, which are crucial for various industrial applications.

Collaborations

Shiliang has collaborated with talented coworkers, including Chunping Xie and Zhenxiao Lu, who contribute to the innovative environment at Milliken & Company.

Conclusion

Shiliang Han's contributions to additive compositions and polymer technology highlight his role as an influential inventor in the industry. His patent reflects a commitment to advancing material science, showcasing the importance of innovation in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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