Kaohsiung, Taiwan

Shih-Jung Chen

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Eternal Materials Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shih-Jung Chen. Retrieved from https://idiyas.com/inventor/shih-jung-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations of Shih-Jung Chen in Optical Film Technology.

Introduction

Shih-Jung Chen is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of optical film technology, particularly in the development of materials used in backlight modules.

Latest Patents

Shih-Jung Chen holds a patent for an optical film composite applicable in a direct type backlight module. This innovative optical film composite includes a brightness enhancement element and a light diffusion element. The light diffusion element features a substrate with a light diffusion layer on at least one side, achieving a haze of no less than 98% as measured according to the JIS K7136 standard method.

Career Highlights

Shih-Jung Chen is associated with Eternal Materials Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the performance of optical films used in various applications.

Collaborations

Shih-Jung Chen collaborates with talented individuals such as Yu-Ming Sun and Chin-Yi Liao, who contribute to the innovative projects at Eternal Materials Co., Ltd.

Conclusion

Shih-Jung Chen's contributions to optical film technology exemplify the impact of innovation in enhancing modern display technologies. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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