Shih J Wei

Title: Shih J Wei: Innovator in Integrated Circuit Technology

Introduction

Shih J Wei is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, particularly through his innovative designs and patents. His work has implications for the advancement of semiconductor technology.

Latest Patents

Shih J Wei holds a patent for a "Metal-insulator-metal capacitor within metallization structure." This patent describes a metallization structure of an integrated circuit (IC) that includes an intermetal dielectric (IMD) layer, a patterned metal layer embedded in the IMD layer, and a patterned top metal layer. The design also features electrical vias that connect the patterned top metal layer and the patterned metal layer embedded in the IMD layer. The metal-insulator-metal (MIM) capacitor consists of a first capacitor metal layer, a second capacitor metal layer, and an insulator layer positioned between them. This innovative design enhances the performance and efficiency of integrated circuits.

Career Highlights

Shih J Wei is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves developing advanced technologies that push the boundaries of integrated circuit design. His contributions have been instrumental in the company's success and innovation.

Collaborations

Shih J Wei has collaborated with esteemed colleagues, including Chi-Han Yang and Lung-Hui Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Shih J Wei's work in integrated circuit technology exemplifies the spirit of innovation. His patent for the metal-insulator-metal capacitor showcases his commitment to advancing semiconductor technology. His contributions continue to influence the industry and inspire future innovations.