Company Filing History:
Years Active: 2018-2021
Title: Innovations of Inventor Shih-Hsien Ma
Shih-Hsien Ma is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents, his work focuses on enhancing the efficiency and functionality of integrated circuit devices.
Latest Patents
Shih-Hsien Ma's latest patents include advancements in semiconductor structures and integrated circuit devices. One of his notable inventions is a semiconductor structure that features a substrate containing both high and low topography regions. This innovative design includes an outer protection wall on the peripheral portion of the high topography region, which is adjacent to the low topography region. Additionally, an anti-reflective coating is applied over the outer protection wall, as well as the high and low topography regions. These inventions aim to improve the performance and reliability of semiconductor devices.
Career Highlights
Shih-Hsien Ma is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Haw-Chuan Wu and Shih-Hao Tsai. Their collaborative efforts contribute to the innovative projects at Taiwan Semiconductor Manufacturing Company Limited.
Conclusion
In summary, Shih-Hsien Ma is a prominent inventor whose work in semiconductor technology has led to valuable patents and advancements in integrated circuit devices. His contributions continue to shape the future of the semiconductor industry.