Shih-Chung Chen

Title: Shih-Chung Chen: Innovating Semiconductor Processing

Introduction

Shih-Chung Chen is an accomplished inventor based in Cupertino, CA, recognized for her significant contributions to the field of semiconductor technology. With a focused approach on enhancing material structures, she holds one notable patent that showcases her expertise and innovation.

Latest Patents

Shih-Chung Chen's patent involves "Treatments to enhance material structures." This invention details processing methods aimed at producing semiconductor structures incorporating high-k dielectric materials. The methods include delivering nitrogen-containing or oxygen-containing precursors to a substrate within a semiconductor processing chamber. By forming reactive ligands on the substrate's exposed surface, these processes enable the development of high-k dielectric materials over the substrate, advancing the efficiency and effectiveness of semiconductor devices.

Career Highlights

As a part of Applied Materials, Inc., Shih-Chung has been instrumental in pushing the boundaries of semiconductor manufacturing technology. Her innovative methodologies not only contribute to her organization's goals but also pave the way for advancements in the semiconductor industry as a whole.

Collaborations

In her professional journey, Shih-Chung collaborates with esteemed colleagues, including David Chu and Steven C Hung. Together, they share a common vision of revolutionizing semiconductor processing and enhancing material performance, working towards achieving excellence in their respective areas of expertise.

Conclusion

Shih-Chung Chen is a prime example of how innovation can drive progress in technology. Her patent demonstrates a commitment to enhancing semiconductor structures, a crucial aspect of modern electronics. As she continues her work at Applied Materials, Inc., the impact of her contributions will undoubtedly influence the future of semiconductor processing.