Company Filing History:
12 out of 330 
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1 out of 1 Years Active: 2009-2013
Title: The Innovations of Shih-Chun Lo: A Pioneer of Dendritic Materials
Introduction
Shih-Chun Lo, an accomplished inventor based in Oxford, GB, has significantly impacted the field of dendritic materials and organometallic chemistry. With an impressive portfolio of 13 patents to his name, his work is not only innovative but also pivotal in advancing technology in various applications.
Latest Patents
Among Lo's latest contributions are two notable patents focused on unique dendrimer structures. The first, titled "Neutral Metallic Dendritic Complexes," describes a charge-neutral organometallic dendrimer characterized by the formula (I): CORE-[DENDRITE(-Q)]. This complex involves a metal cation and various coordinating groups, showcasing extraordinary potential in coordination chemistry and materials science. The second patent, "Aryl-Aryl Dendrimers," details light-emitting devices that feature dendrimers built from conjugated structures of aryl and heteroaryl groups, which are interconnected through specific chemical bonds. These innovations represent significant advancements in organic materials for electronic applications.
Career Highlights
Shih-Chun Lo's career includes notable engagements with Isis Innovation Limited and the University Court of the University of St. Andrews. His roles at these institutions have allowed him to push the boundaries of research and transform theoretical concepts into practical applications. His extensive research experience contributes to his understanding and development of advanced dendritic materials.
Collaborations
Throughout his career, Shih-Chun Lo has collaborated with esteemed colleagues, including Paul Leslie Burn and Ifor David William Samuel. These partnerships have fostered an environment of shared knowledge and innovative thinking, leading to groundbreaking discoveries in the field of materials science.
Conclusion
In summary, Shih-Chun Lo exemplifies the spirit of innovation through his development of novel dendritic structures and organometallic complexes. His contributions, marked by his numerous patents, pave the way for future advancements in various fields, including electronics and materials science. His ongoing work continues to inspire the next generation of inventors and researchers.