This inventor holds 1 USPTO granted patent. Top assignee: Nan Ya Technology Corporation. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Shih-Chieh Kao: Innovator in Metal Etching Post Cleaning
Introduction
Shih-Chieh Kao is a notable inventor based in Keelung, Taiwan. He has made significant contributions to the field of metal etching, particularly through his innovative methods that enhance the cleaning processes involved in this technology. His work is recognized for its practical applications in various industries.
Latest Patents
Kao holds a patent for a method of metal etching post cleaning. This patent describes a process that begins with a substrate covered by a patterned metal layer and a patterned resist layer. The method involves performing oxygen-plasma ashing to remove the resist layer, followed by ozone-plasma ashing to release charges on the metal layer's surface. The ozone-plasma ashing is conducted at a specific time and temperature, ensuring optimal results. Finally, the surface is cleaned with sulfuric peroxide, with precise concentrations and temperatures specified for effective cleaning.
Career Highlights
Shih-Chieh Kao is currently employed at Nan Ya Technology Corporation, where he continues to develop and refine his innovative techniques. His work has not only advanced the field of metal etching but has also contributed to the efficiency and effectiveness of manufacturing processes in related industries.
Collaborations
Kao collaborates with talented individuals such as Yi-Nan Chen and Hui Min Mao, who contribute to the innovative environment at Nan Ya Technology Corporation. Their teamwork fosters creativity and drives advancements in technology.
Conclusion
Shih-Chieh Kao's contributions to metal etching post cleaning exemplify the impact of innovation in technology. His patent and ongoing work at Nan Ya Technology Corporation highlight the importance of continuous improvement in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile