Shih-Chang Shih

Title: Innovations of Shih-Chang Shih in Lithography Technology.

Introduction

Shih-Chang Shih is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly in the development of advanced mask technologies. His work is crucial for the semiconductor manufacturing industry, where precision and innovation are paramount.

Latest Patents

Shih holds a patent for an EUV lithography mask with a porous reflective multilayer structure. This innovative lithography mask includes a substrate made from a low thermal expansion material (LTEM). The reflective structure consists of multiple layers, with at least one layer being porous. The mask is designed by forming a multilayer reflective structure over the LTEM substrate, which includes a series of repeating film pairs. Each film pair consists of a first layer and a porous second layer, culminating in a capping layer and an absorber layer.

Career Highlights

Shih-Chang Shih is currently employed at Taiwan Semiconductor Manufacturing Co., Ltd., a leading company in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing lithography technologies that are essential for modern chip manufacturing.

Collaborations

Shih has collaborated with several talented individuals in his field, including Chih-Tsung Shih and Li-Jui Chen, who is a prominent female engineer. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Shih-Chang Shih's contributions to lithography technology exemplify the importance of innovation in the semiconductor industry. His patent for the EUV lithography mask showcases his expertise and commitment to advancing technology.