Location History:
- Selangor, MY (1993)
- Darul Ehsan, MY (1995 - 1996)
- Kualo Lumpur, MY (1999)
- Kuala Lumpur, MY (1998 - 2000)
Company Filing History:
Years Active: 1993-2000
Title: The Innovative Mind of Shigeyoshi Netsu
Introduction
Shigeyoshi Netsu is a prominent inventor based in Kuala Lumpur, Malaysia, known for his contributions to the field of silicon wafer technologies. With a remarkable portfolio of seven patents, Netsu has demonstrated his expertise in developing innovative solutions that enhance the semiconductor manufacturing process.
Latest Patents
Netsu's latest patents showcase groundbreaking methods and apparatuses in silicon wafer etching and cleaning. One notable patent details a silicon wafer etching method that utilizes an alkali aqueous solution as an etchant. This solution, which contains sodium hydroxide at a weight concentration between 50.6% and 55.0%, significantly minimizes surface roughness and dispersion during the etching process. Another remarkable invention is a cleaning apparatus designed to produce and spray OH⁻ ionized water and H⁺ ionized water onto substrates. This system not only includes a substrate holding member but also incorporates an electrolytic ion generating member and an ultrasonic wave generating member, allowing for effective cleaning of the substrate with freshly produced solutions.
Career Highlights
Throughout his career, Shigeyoshi Netsu has worked with prestigious companies including Shin-Etsu Handotai Co., Ltd. and Pre-Tech Co., Ltd. His experiences at these companies have undoubtedly influenced his innovative capabilities and have allowed him to develop several impactful patents in the semiconductor sector.
Collaborations
Netsu has also collaborated with esteemed colleagues such as Yasuyuki Harada and Kihachiro Watanabe. Together, they have pushed the boundaries of semiconductor technology, contributing valuable insights and breakthroughs in their respective fields.
Conclusion
In summary, Shigeyoshi Netsu is an innovative force in the realm of silicon wafer technology, with a proven track record of patents that reflect significant advancements in etching and cleaning methods. His work continues to influence the semiconductor industry, paving the way for future innovations that improve manufacturing processes.